DIP Cold UV Point Plasma Implant Activation Generator

DIP Point Plasma is a specialized device designed to enhance the characteristics of regular implants and increase the osseointegration process speed. It works by rendering the implant surface more hydrophilic and eliminating hydrocarbon pollutants that tend to accumulate on the surface over time. This enhanced hydrophilicity fosters bone formation on the implant surface, leading to improved osseointegration and reduced recovery time. Additionally, the application of plasma stimulates tissue cells, boosting blood circulation and facilitating tissue regeneration.

The most remarkable advantage of this technology is that it not only cleans the implant surface and optimizes the implantation procedure but also does so swiftly, completing the process in just 60 seconds. This efficiency means it can be performed spontaneously without the need for pre-planning. Moreover, the operation is carried out without compromising the integrity of the implant packaging, ensuring its sterility and immediate usability.

During the plasma implant activation process, microscopic carbon-based contaminants are effectively removed, while surface energy is increased, enhancing wettability and promoting protein and cell interactions at a molecular level. Furthermore, the device can process two implants simultaneously while maintaining the sterile barrier, further streamlining the procedure.

Indications:

• Enhancing the characteristics of regular implants
• Streamlining the osseointegration process
• Rendering implant surfaces more hydrophilic
• Eliminating hydrocarbon pollutants
• Stimulating tissue cells with plasma
• Shortening overall recovery times

Features & Benefits:

• Significantly improves implant characteristics for superior performance
• Enhances the osseointegration process, ensuring successful integration with the bone
• Converts implant surface to highly hydrophilic, optimizing biological interactions
• Removes hydrocarbon pollutants, ensuring a clean and pristine implant surface
• Stimulates bone formation directly on the implant surface, fostering faster healing
• Utilizes plasma energy to activate tissue cells, promoting accelerated tissue regeneration
• Swift operation completed in just 60 seconds, maximizing efficiency
• Offers flexibility for spontaneous use, eliminating the need for meticulous pre-planning
• Maintains the integrity of implant packaging
• Ensures immediate implant readiness without compromising sterility
• Capable of processing two implants simultaneously, optimizing time and resources
• Compatible with any implant brand with a clear sterile vial packaging

Technical Characteristics:

• Model: Plasma Active
• Size: 150 x 354 x 267mm
• Display: Capacitive touch IPS LCD
• Capacity: 2 Implants vials up to 65mm height / 28mm thickness
• Processing time: 60-120 sec
• Output: 220V, 50-60Hz
• Power: 200W
• Weight: 8kg

The package includes 1 DIP Plasma generator

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